Wednesday, October 24
12:00 Registration
13:00 Exhibit set-up
15:00 Equipment Exhibit, Fairway Deck
18:00 Welcome Reception, Fairway Deck

Thursday, October 25, Silverado Ballroom
7:15 Breakfast, Fairway Deck
Session 1: Keynote Session - Session Chairs: Doug Resnick, Molecular Imprints Inc, and Stephen Chou, Princeton University

8:00		Welcome: Stephen Chou and Doug Resnick
8:20	Invited 1	Manufacturing of Displays Using Self-Aligned Imprint Lithography	Carl Taussig	HP
8:55	Invited 2	The Advance of Bit Pattern Media Fabrication with Nano-imprinting Technology	Tsai-Wei Wu	HGST
9:30	Invited 3	NSF Engineering Directorate and the Role of Nanopatterning	George Maracas	National Science Foundation

10:05 Break, Fairway Deck
Session 2: Roll-to-Roll Imprint Lithography - Session Chairs: Jay Guo, University of Michigan, and Jin Choi, Molecular Imprints Inc.

10:40	2.1 Invited	Roll-to-Roll Nanopatterning Using Jet and Flash Imprint Lithography	Jin Choi	Molecular Imprints Inc.
11:10	2.2	Manufacturing of smart fibers by high-speed reel-to-reel imprint using cylinder mold	Harutaka Mekaru	BEANS Project
11:25	2.3	Three dimensional nanoimprint lithography: from parallel to roll-to-roll processing	Nikos Kehagias	Catalan Institute of Nanotechnology
11:40	2.4	Simulation of roll-to-roll and roll-to-plate NIL: modeling the effects of process speed, imprinting load, roller elasticity, and pattern design	Hayden Taylor	Nanyang Technological University
11:55	2.5	Development of continuous phase lithography and application to transparent conductor fabrication	Moon Kyu Kwak	University of MIchigan
12:10	2.6	Innovations in rolling imprinting for fast fabrication of micro/nano structures on glass substrates	Sen-Yeu Yang	National Taiwan University

12:30 Lunch, The Grove
Session 3: Applications - Session Chairs: Christophe Peroz, Abeam, and Michael Hornung, Suss

13:50	3.1 Invited	Status of bit patterned media for high density hard drives	Zhaoning Yu	Seagate
14:10	3.2	Defect Reduction for Semiconductor Memory Applications Using Jet and Flash Imprint Lithography	Zhengmao Ye	Molecular Imprints Inc
14:25	3.3	Fabrication of High Quality GaN Template by Nano-channel FIELO Using UV Nanoimprint Lithography for High Efficiency LED	Akiko Okada	Waseda University
14:40	3.4	Ordered SiGe island arrays on pit-patterned Si(001) substrates fabricated by UV-NIL: towards optoelectronic applications	Elisabeth Lausecker	University of Linz
14:55	3.5	Direct nanopatterning for high efficient flexible Organic Light Emitting Diode	So Hee Kim	Pusan National University
15:10	3.6	A Metal Embedded PDMS Mold for Large-Area Patterning of Sapphire Substrates Used in High Brightness Light-Emitting Diodes	Yung-Chun Lee	National Cheng Kung University

3:25 Break, Fairway Deck

16:00 Poster Sessions, Fairway Deck: Session Chairs: Doug Resnick, Molecular Imprints Inc, and Stephen Chou, Princeton University
Applications

P10	Anti-Reflection Structures Fabricated by Angled Two Step UV Nanoimprint Lithography Using Line and Space	Kentaro Ishibashi	Waseda University and Toshiba-Machine Co., Ltd.
P40	Nano-patterned LED using Nano Imprint Lithography and Bi-layer Lift-off Metallization for High Efficiency	Sang-Uk Cho	Pusan National University
P58	Coupling of Quasi-Particles in Nanoimprinted Structures	Clivia Sotomayor Torres	Catalan Institute of Nanotechnology
P60	Embedded permalloy nano-oval fabrication using nanoimprinting and liftoff for Magnetic Quantum-Dot Cellular Automata	Muhammad Atyab Imtaar	Technische Universität München
P89	Rapid fabrication of metal nanocone arrays by Si nanocones	JJ Li	Institute of Physics, CAS
P96	Giant and Wafer-scale Uniform Enhancement of Quantum Dots Fluorescence by a Novel 3D Nanoantenna Array	Hao Chen	Princeton University
P104	Bilayered Hybrid Nanoimprint Strategy for the Planarized Metal Nanostructure in Plasmonic Applications	Jun-Hyuk Choi	Korea Institute of Machinery & Materials
P105	Nano-imprint lithography for high brightness GaN-based LEDs	Heon Lee	Korea University

Bio Applications

P14	Fabrication of Microchambers with Inclined Sidewalls on Pyrex Glass and Quartz Chips by Thermal Imprinting	Harutaka Mekaru	Nat. Inst. of AIST
P83	Multi-functional arrays of multiple colored quantum dot with magnetic nanoparticle via one-step micro/nano imprinting for biomolecular analysis	Yongsuk Oh	KAIST

Characterization

P22	Evaluation of interaction between antisticking layer and UV nanoimprint resin by scanning probe microscopy	Makoto Okada	LASTI, Univ. of Hyogo
P41	Evaluation of the surface energy between UV resist and mold in UV nanoimprint	Tomoki Nishino	Osaka Prefecture University
P51	Nanometrology by image processing and analysis of sub-50 nm 1 and 2D features in BCPs for NIL technology	Claudia C Simao	Institut Catalia de Nanotecnologia
P95	Parallel micro and nano-scale replication – a low cost, high throughput production technique for electronic-, optic-, biosensing and microfluidic structure replication	Kreindl Gerald	EVG

History

P80

A development perspective of nanoimprint lithography from 1995 to 2012 based on a holistic bibliometrical study of patents and articles.

Lars Montelius

Lund University

Imprint Templates

P9	Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabrication	Maximilian Rumler	Fraunhofer IISB
P26	Anisotropic remastering of UV-NIL replica molds for feature size reduction	Elisabeth Lausecker	University of Linz
P42	Experiment and simulation of thermal imprint with Mg-based bulk metallic glass molds	Fuh-Yu Chang	National Taiwan University of Science and Technology
P52	Fabrication of Capacity-Equalized Mold with 50 nm Patters	Kenta Suzuki	Nihon University
P56	Release-property enhanced OrmoStamp for advanced working stamps in nanoimprint lithography	Arne Schleunitz	Micro Resist Technology GmbH
P65	Diamond and DLC Nanoimprint Dies by Ion Implant Masking	Graham L Cross	Trinity College
P66	The Impact of Focused Ion Beam Stamp Repair on Resist Curing in UV-based Nanoimprint Lithography	Simon Waid	Vienna University of Technology
P93	Design rules for 3D stamps manufacturing on 300 mm wafer and their associated replication processes by NanoImprint Lithography	Vincent Reboud	CEA-Leti
P97	High-Precision Duplication of Large-Area Soft-Hard-Hybrid Nanostructured Molds Using Polymer Masters of Good Release	Qi Zhang	Princeton University
P101	A master-mold fabrication for 1Xnm node nanoimprint lithography by EB lithography followed by self-aligned double patterning technique	Hideo Kobayashi	HOYA Corporation

Materials

P1	Novel fluorinated polymers for releasing material in nanoimprint lithography	Tsuneo Yamashita	DAIKIN Ind. Ltd.
P4	Advanced Fluorinated UV-Curable Resin (NIF) for UV Nanoimprint	Yasuhide Kawaguchi	Asahi Glass Company
P11	The Organic/Inorganic Hybrid Material which Exhibits The Self-assembled Glass-like Surface for Nanoimprinting Film	Kazuhisa Kumazawa	Nippon Soda Co., LTD.
P21	Functional epoxy polymer for direct nano-imprinting of micro optical elements	Robert Fader	Fraunhofer IISB
P29	UV-curable resins suitable for UV-NIL in pentafluoropropane	Masaru Nakagawa	Tohoku University
P30	Synthesis of Fluorinated Si-sol Precursor for Nanoimprint Lithography (NIL) Application	Dongjin Nam	DONGJIN SEMICHEM CO.,LTD.
P73	Reorientation of Photoinduced Liquid Crystalline Polymer Induced by Thermal Nanoimprinting with Linearly Polarized UV Irradiation	Makoto Okada	LASTI, Univ. of Hyogo
P76	Sub-10nm thick epoxy films structured by UV Lithography and UV-NIL	Vaida Auzelyte	École Polytechnique Fédérale de Lausanne

Modeling

P31	Droplet Behavior Prediction in Dispensing-based NIL Using Control Volume Finite Element Method	Kiju Sohn	Seoul National University
P32	Addressing the mechanical deformation of flexible stamps for nanoimprint lithography on double-curved surfaces	Mads R Sonne	Technical University of Denmark
P90	Shear thinning threshold criterion in thermal NanoImprint lithography	Etienne Rognin	CEA-LETI-Minatec Campus
P50	Simulation study on stress relaxation in organic martial	Naoki Nishikura	Osaka. Prefecture University

Processing

P5	Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L)	Khalid Dhima	University of Wuppertal
P6	Preparation of surface with patterned roughness for sensing applications	Si Wang	University of Wuppertal
P12	Area-Extended Wire-Grid Polarizer via Step and Repeat Nanoimprint Lithography	Kohsuke Takayama	Asahi Glass
P15	Sidewall angle dependent pre-filling states in asymmetric stamp cavities using thermal nanoimprint lithography	Helmut Schift	Paul Scherrer Institut (PSI)
P18	3-D surface topography patterning based on a glass transition temperature selective thermal reflow for backlight displays	Helmut Schift	Paul Scherrer Institut (PSI)
P28	Control of self-assembly defects in thermal nanoimprint	Andre Mayer	University of Wuppertal
P34	Throughput of UV nanoimprint based on gas condensation	Hiroshi Hiroshima	National Institute of Advanced Industria
P35	Removal of thermoplastic resin adhered on mold by high hydrostatic pressure	Shinichiro Sone	Soka University
P36	Gap pattern narrowing by multiple patterning with nanoelectrode lithography	Atsushi Yokoo	NTT Basic Research Laboratories
P43	Controlled dewetting under confinement for zero residual layer nanoimprint	Etienne Rognin	CEA-LETI-Minatec Campus
P44	Direct Patterning of Oxides Using Step-and-Flash Imprint Lithography	M. S. M. Saifullah	Institute of Materials Research and Engineering
P49	Directed self-assembly of block copolymers mediated by solvent assisted NIL	Claudia C Simao	Institut Catalia de Nanotecnologia
P53	UV-based Nanoimprint Lithography for large area structuring of graphene and for making metallic contacts	Wolfgang Hackl	Profactor GmbH
P54	Extremely Thin Suspended Membranes by Combining Nanoimprinting and Atomic Layer Deposition	Jouni Ahopelto	VTT Technical Research Centre of Finland
P57	Improvement of Demolding Characteristics by Ar Plasma Treatment	Hiroaki Kawata	Osaka Prefecture University
P59	Anode Structuring in OPDs/LEDs Using Nano Transfer Printing	Anandi Yadav	Technical University of Munich
P62	Nanoimprinting Ultra Small and High Aspect Ratio Structures by Using Modulus-Tunable UV Cure Epoxy Resist	Young Jae Shin	University of Michigan
P69	Direct imprinting of inorganic functional films: a novel route for fabricating nanophotonic devices	Carlos A Pina-Hernandez	aBeam Technologies
P71	Imprint Mold Cleaning with Polydimethylsiloxane (PDMS)	Peng Lin	University of Massachusetts Amherst
P72	Critical Dimension Control of Nanoimprint Lithography and Pattern Transfer on Sub-10 nm Scale	Shuang Pi	ECE Dept. UMass Amherst
P74	Fabricating inserted Cu mesh electrode inside flexible substrate by nanoimprint lithography	Chia-Meng Chen	National Tsing Hua University
P75	Influence of Solvent Removal and UV-exposure on Feature Shrinkage in UV-NIL Direct Patterning	Robert Kirchner	TU Dresden
P85	Residual Layer Optimization for 3D Nanoimprint Lithography	Michael Hornung	SUSS MicroTec Lithography GmbH
P91	Annealing-free, smooth, flexible silver nanowire/polymer composite electrodes via two-step aerosol-jet printing method	Dong Yun Choi	KAIST
P94	Novel nanoimprint process for lift-off by using bi-layer resist system	Hiroaki Kawata	Osaka Prefecture University
P103	Advanced Metal Nanopatterning through Dual Resist-Nanoimprint and Si-based Etch Mask	Jun-Hyuk Choi	Korea Institute of Machinery & Materials

Roll-to-Roll Imprint Lithography

P64	Continuous photo-roller-lithography and application to large area IR metamaterial and transparent conductor fabrication	Young Jae Shin	University of Michigan
P99	Sub- 50nm Roller Nanoimprint Using Flexible Hard-Soft-Hybrid Polymer Thin-Film Stamps and Applications to Large-Area High-Performance Nanoplasmonics	Qi Zhang	Princeton University
P106	Fabrication of Infrared Sensors using Roll to Roll Nanoimprinted Grating	Jeffrey Morse	University of Massachusetts Amherst

 

18:00 Wine Tasting, The Grove
19:00 Banquet, The Grove

Friday, October 26, Silverado Ballroom
Session 5: Process, Materials and Characterization 1 – Session Chairs: Akihiro Miyauchi, Hitachi Research Laboratory, and Hella-Christine Scheer, Bergische University

8:00	5.1 Invited	Three-dimensional micro-optics patterning by wafer-scale nanoimprint lithography on 8" and12" wafers	Vincent Reboud	CEA-Leti
8:30	5.2	Reduction in Viscosity of Quasi-2D-Confined Nanoimprint Resin through the Addition of Fluorine-Containing Monomers: Shear Resonance Study.	Yuzuru Shimazaki	Hitachi Ltd.
8:45	5.3	Simple UV direct imprinting of photonic microring resonators with high quality from spin coated hybrid-polymer films	Robert Kirchner	Technische Universität Dresden
9:00	5.4	Micro- and Nano-scale Molding Based on Electrohydrodynamic Deformation of Dielectric Polymer	Hongbo Lan	Xi'an Jiaotong University
9:15	5.5	Monitoring of filling process using DFIM system in UV nanoimprint lithography	Qing Wang	AIST
9:30	5.6	Interface expansion of hetero structured organic photovoltaics (OPV) by multi-layered direct nanoimprint	Tomohiro Kohei	Osaka Prefecture University

9:45 Break, Fairway Deck
Session 6: Bio Applications – Session Chairs: Helmut Schift, Paul Scherrer Institut, and Lars Montelius, Lund University

10:20	6.1 Invited	A novel 3-D cell culture device with nano pillars for hepatocyte spheroids	Akiko Hisada	Hitachi Central Research
10:50	6.2	Fabrication and Performance of Ultra-sensitive, Fast, Nanoplasmonic Microfluidic Immunoassay by Large-Area High-Precision Nanoimprint	Ruoming Peng	Princeton University
11:05	6.3	Wafer scale fabrication of 3D inlets in nanofluidic devices	Irene Fernandez-Cuesta	LBNL
11:20	6.4	Up-scaling of swellable hydrogels for biosensor applications using step-and-repeat thermal nanoimprinting lithography	Achille Francone	Catalan Institute of Nanotechnology
11:35	6.5	Nanoimprint Patterning for Efficient and Stable Bio-Fuel Cells	Richard Sundberg	Lund University
11:50	6.6	Creating Nanometer Size Protein Patterns for the Investigation of Protein-Protein Interactions in Live Cells using Microcontact Printing with Hard Stamps	Michael Muehlberger	PROFACTOR GmbH

12:05 Lunch, The Grove
Session 7: Large Area Imprint Lithography – Session Chairs: Clivia M Sotomayor Torres, Catalan Institute of Nanotechnology, and Atsushi Yokoo, NTT

13:30	7.1 Invited	Substrate Conformal Imprint Lithography techniquefor photonic crystalpatterning on LEDs	Marc Verschuuren	Philips Corp
14:00	7.2	Large Area Seamless Roller Mold Using Fast EB Lithography(rEBL) for R2R Process	Naoto Ito	Asahi Kasei
14:15	7.3	Fabrication of Large-Area Nanoplasmonic Sensors, Solar Cells, and Filters Using Planar or Roller Nanoimprint with Molds Generated without EBL	Stephen Y Chou	Princeton University
14:30	7.4	Large Area Micro-Structuring of Viscous Drag Reducing Riblets by Roll-to-Roll-UV-Imprint-Lithography	Dieter Nees	Joanneum Research Forschungsgesellschaft
14:45	7.5	Pre-filling states in replication of cylinder microlenses using roll-to-plate thermal nanoimprint lithography	Helmut Schift	Paul Scherrer Institut (PSI)
15:00	7.6	Flexible Touch Pad on Mechanically Robust Paper Substrate Fabricated by Direct Stamping of Silver Nano-Ink	Woo Soo Kim	Simon Fraser University

15:15 Break, Fairway Deck

Session 8: Process, Materials and Characterization 2 – Session Chairs: Shinji Matsui, University of Hyogo, and Jouni Ahopelto, VTT Helsinki

16:00	8.1 Invited	Fabrication of negative index metamaterial prims by UV-NIL	Iris Bergmair	Profactor GmbH
16:30	8.2	Thermally-Adaptive Alignment for Nanoimprinting	Euclid E Moon	MIT
16:45	8.3	A universal scheme for direct thermal nanoimprint lithography of oxides	Saman Safari Dinachali	National University of Singapore
17:00	8.4	Continuous nanoimprint on a polymer sheet by in-situ formation of release layer	Masahiko Ogino	Hitachi, Ltd,
17:15	8.5	Single digit nanofabrication by step-and-repeat nanoimprint lithography	Christophe Peroz	aBeam Tech. & The Molecular Foundry
17:30	8.6	Self-assembly of gold nanoparticles using imprinted HSQ pattern for SERS measurement	Yuji Kang	University of Hyogo